Comparative analysis of a CML cell line resistant to cyclophosphamide using oligonucleotide arrays and response to TKI

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PubMed ID: 17403535
Contact: Reinhold Munker

Image:email_GSE7114.png
LSU Health Sciences Center

Species:
Platform:
Number of Samples: 10
Date Range: 01/13/2005 - 02/02/2005
Experiment Quality: 86.14
2.36 %
91.89
Link to Repository: GSE7114
Original Intensity Data: Download
Clean Intensity Data: Download
Original PLIER Data: Download
Clean PLIER Data: Download
Clean CEL Files: Download
Data Rank:

Acquired imatinib resistance in chronic myelogenous leukemia (CML) can be the consequence of mutations in the kinase domain of BCR-ABL or increased protein levels. However, as in other malignancies, acquired resistance to cytostatic drugs is a common reason for treatment failure or disease progression. As a model for drug resistance, we developed a CML cell line resistant to cyclophosphamide (CP). Using oligonucleotide arrays, we examined changes in global gene expression. Selected genes were also examined by real-time PCR and flow cytometry. Neither the parent nor the resistant lines had mutations in their ATP binding domain. Filtering genes with a low-base line expression, a total of 239 genes showed significant changes (162 up- and 77 down-regulated) in the resistant clone. Most of the up-regulated genes were associated with metabolism, signal transduction, or encoded enzymes. The gene for aldehyde dehydrogenase 1 was over-expressed more than 2000 fold in the resistant clone. BCR-ABL was expressed in both cell lines to a comparable extent. When exposed to the tyrosine kinase inhibitors imatinib and nilotinib, both lines were sensitive. In conclusion, we found multiple genetic changes in a CML cell line resistant to CP related to metabolism, signal transduction or apoptosis. Despite these changes, the resistant cells retained sensitivity to tyrosine kinase inhibitors.

Design: A CML cell line and a CP resistant subline were compared by gene array. In addition other markers, the expression of BCR-ABL and the sensitivity to tyrosine kinase inhibitors were tested.

Type: Cell type comparison


Contents

[edit] Contributors

  • Fei Bao
  • Paula Polk
  • Mary L Nordberg
  • Diana M Veillon
  • Amanda W Sun
  • Michael Deininger
  • David Murray
  • Borje S Andersson
  • Reinhold Munker

[edit] Protocols

[edit] References

[edit] Links

GEO Accession for this experiment: GSE7114. (Public on Feb 24 2007)

PubMed abstract: 17403535

RAW data: tar file.

[edit] Analysis

[edit] Samples/Quality Control

Sample Date Scanned Source Link Probe Variance Data Artifact Mask Quality Score
Sensitive Replicate 1 01/13/05 09:51:03 GSM170886 Probe variance for  Sensitive Replicate 1 Artifact mask for  Sensitive Replicate 1 94.4429
1.96 %
96.24
Sensitive Replicate 2 01/13/05 10:04:29 GSM170887 Probe variance for  Sensitive Replicate 2 Artifact mask for  Sensitive Replicate 2 94.612
1.1 %
96.75
Sensitive Replicate 3 01/13/05 10:13:05 GSM170888 Probe variance for  Sensitive Replicate 3 Artifact mask for  Sensitive Replicate 3 94.0445
1.69 %
96.18
Sensitive Replicate 4 02/02/05 09:58:33 GSM170889 Probe variance for  Sensitive Replicate 4 Artifact mask for  Sensitive Replicate 4 95.0489
1.11 %
96.97
Sensitive Replicate 5 02/02/05 09:48:53 GSM170890 Probe variance for  Sensitive Replicate 5 Artifact mask for  Sensitive Replicate 5 94.815
3.16 %
95.83
Resistant Replicate 1 01/13/05 11:23:12 GSM170891 Probe variance for  Resistant Replicate 1 Artifact mask for  Resistant Replicate 1 95.2138
1.28 %
96.97
Resistant Replicate 2 01/13/05 11:30:06 GSM170892 Probe variance for  Resistant Replicate 2 Artifact mask for  Resistant Replicate 2 94.5091
2.81 %
95.85
Resistant Replicate 3 01/13/05 11:37:30 GSM170893 Probe variance for  Resistant Replicate 3 Artifact mask for  Resistant Replicate 3 94.7837
5.02 %
94.88
Resistant Replicate 4 02/02/05 10:08:41 GSM170894 Probe variance for  Resistant Replicate 4 Artifact mask for  Resistant Replicate 4 95.1294
2.13 %
96.5
Resistant Replicate 5 02/02/05 10:17:51 GSM170895 Probe variance for  Resistant Replicate 5 Artifact mask for  Resistant Replicate 5 94.9519
5.72 %
94.62